Skip to content. | Skip to navigation

You are here: Home » Physics & Astronomy » Pressroom » Seminars » Dielectric Ultracapacitors Based on Ferroelectric Thin Film Heterostructures
Document Actions

Dielectric Ultracapacitors Based on Ferroelectric Thin Film Heterostructures

Dielectric Ultracapacitors Based on Ferroelectric Thin Film Heterostructures

Categories
When Mar 27, 2018
from 11:30 am to 12:30 pm
Speaker Jun Ouyang Ph.D.
Speaker Information National Institute of Standards and Technology
Where 1311 HN
Contact Name Yuhang Ren
Contact Email
Contact Phone 212-772-5258
Add event to calendar vCal
iCal

ABSTRACT:

Finding an ultimate device solution for both high density storage and rapid supply of electricity is an emergent problem in the fast-growing field of energy science and technology.  Compared with batteries, fuel cells and electrochemical supercapacitors, dielectric capacitors excel in specific power, compactness and cost-effectiveness, but lag behind in energy density.  Here I will present our recent work in "dielectric ultracapacitors" based on ferroelectric thin film heterostructures, which have demonstrated very high energy densities (up to ~166 J/cm3) and efficiencies (up to 96%), as well as superior stabilities over a broad range of electric fields, frequencies and temperatures.  The boosted energy performance of these ferroelectric capacitors can be attributed to an adaptive nano-domain structure.  The talk will end with a discussion of associated nanoengineering methods, and an outlook of ongoing work for deployment of these ultracapacitor structures in Si-technologies.

« December 2018 »
December
MonTueWedThuFriSatSun
12
3456789
10111213141516
17181920212223
24252627282930
31
Go to full calendar…